Hydrogen Peroxide – 30% – ACS & Electronic (Semi) Grade
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Hydrogen Peroxide – 30% – ACS & Electronic (Semi) Grade
Hydrogen Peroxide, available in both ACS Reagent and Semiconductor (Semi) Grades, is a high-purity oxidizing agent essential for numerous laboratory, industrial, and semiconductor applications. Whether used for cleaning, etching, or analytical processes, our Hydrogen Peroxide delivers exceptional purity, stability, and performance.
Price range: $ 104.13 through $ 850.00
Description
Hydrogen Peroxide - 30% - ACS Reagent or Semiconductor Grade
CAS# 7722-84-1
DESCRIPTION
Hydrogen Peroxide, ACS Reagent and Semiconductor (Semi) Grade, also known as Hydrogen Dioxide Solution, is a clear, colorless liquid with a slight acrid odor. With the chemical formula H2O2, this compound is widely used as an oxidizing agent in laboratory, industrial, and high-purity applications due to its powerful reactivity and clean decomposition into water and oxygen.
Our Hydrogen Peroxide is available in two high-purity grades:
- ACS Reagent Grade: Meets American Chemical Society (ACS) standards for purity, suitable for analytical and research use in laboratories and general industry.
- Semiconductor (Semi) Grade: Exceeds ACS purity requirements, designed for contamination-sensitive applications such as semiconductor wafer cleaning, microelectronics, and precision chemical processes.
BENEFITS
- High-Purity Formulations: Available in ACS and Semiconductor Grades for precise, low-contaminant performance.
- Strong Oxidizing Properties: Effective for cleaning, bleaching, and oxidation in laboratory and industrial processes.
- Environmentally Friendly Decomposition: Breaks down into water and oxygen with no toxic residue.
- Versatile Applications: Used in electronics, pharmaceuticals, analytical chemistry, and advanced material manufacturing.
Hydrogen Peroxide - ACS Reagent Grade Specifications/Applications
ACS Grade Specifications
| Specification | Maximum Limits |
|---|---|
| Appearance | Colorless and free from suspended matter or sediment |
| Assay | 29 – 32% |
| Color (APHA) | 10 |
| Residue after Evaporation | 0.000020 |
| Phosphate | 2 ppm |
| Ammonium (NH?) | 5 ppm |
| Titratable Acid | 0.0006 meq/g |
| Chloride (Cl) | 3 ppm |
| Iron (Fe) | 0.5 ppm |
| Sulfate (as SO?) | 5 ppm |
| Nitrate (as NO?) | 2 ppm |
| Heavy Metals (as Pb) | 1 ppm |
ACS Reagent Grade Applications
- Analytical Chemistry: Used for oxidation reactions, titrations, and sample preparation.
- Laboratory Cleaning and Disinfection: Commonly used as an oxidizer and sterilizing agent in laboratory environments.
- Industrial Processing: Applied in bleaching, wastewater treatment, and other controlled oxidation processes.
Hydrogen Peroxide - Semiconductor Grade Specifications/Applications
Semiconductor Grade Specifications
| Specification | Maximum Limits | Specification | Maximum Limits | Specification | Maximum Limits |
|---|---|---|---|---|---|
| Assay (as H2O2) | 29 – 32% | Color (APHA) | 10 | Free Acid (as H2SO4) | 0.6 µeq/g |
| Residue after Evaporation | 0.000020 | Chloride (Cl) | 0.000002 | Sulfate (SO4) | 0.000005 |
| Phosphate (PO4) | 0.000002 | Heavy Metals (as Pb) | 0.000000 | Arsenic & Antimony (as As) | 0.01 ppm |
| Aluminum (Al) | 1 ppm |
Trace Element Specifications
| Element | Max (ppm) | Element | Max (ppm) | Element | Max (ppm) |
|---|---|---|---|---|---|
| Barium (Ba) | 1 | Boron (B) | 0.5 | Cadmium (Cd) | 1 |
| Calcium (Ca) | 1 | Cobalt (Co) | 0.5 | Copper (Cu) | 0.1 |
| Gallium (Ga) | 0.5 | Germanium (Ge) | 1 | Gold (Au) | 0.5 |
| Iron (Fe) | 0.5 | Lead (Pb) | 0.5 | Lithium (Li) | 1 |
| Magnesium (Mg) | 0.1 | Manganese (Mn) | 1 | Nickel (Ni) | 0.1 |
| Potassium (K) | 1 | Silicon (Si) | 1 | Silver (Ag) | 0.5 |
| Sodium (Na) | 1 | Strontium (Sr) | 1 | Tin (Sn) | 1 |
| Zinc (Zn) | 1 |
Semiconductor (Semi) Grade Applications
- Semiconductor Manufacturing: Utilized in wafer cleaning, oxidation, and surface preparation steps requiring ultra-pure oxidizing conditions.
- High-Purity Chemical Processing: Applied in processes where even trace metal contamination must be eliminated.
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