NuSolv XTR Positive Photoresist Stripper Is a 100% chemical equivalent drop-in replacement to Baker PRS-3000 photo resist stripper from JT Baker. NuSolv XTR photoresist stripper and ash/etch residue remover provides versatile cleaning in traditional semiconductor with aluminum silicon dioxide layers; compound semiconductor and packaging applications (flip chips/bumps). NuSolv XRTR is Semicon grade and meets electronics grade specs.
• Efficient bulk resists removal providing photoresist removal in 5–20 minutes
• 100% water soluble formulation—no intermediate solvent rinse required resulting in decreased total process time and costs
• Designed to provide broad process latitude in terms of processing time and temperature
• Long bath life—typically greater than 24 hours
• Does not contains fluoride or hydroxylamine
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